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Furnace Stack
| MANUFACTURER | Tystar |
|---|---|
| MODEL | 4600 |
London Centre for Nanotechnology
| TRAINING | Training is required to use this item and we can arrange this if needed. |
|---|
| CONTACT 1 | Steve Etienne |
|---|---|
| CONTACT 2 | Vijay Krishnan |
| Enquire about this item | |
| SITE | Bloomsbury Campus |
Description
Four independent tubes with max temperature of 1050C
- 1 High Purity Dry and Wet Oxidation, with TransLC pre-cleaning for CMOS compatible Silicon wafers
- 2 General Purpose Dry and Wet Oxidation
- 3 Diffusion and Drive in in Oxidising atmosphere for CMOS silicon wafers
- 4 Annealing in Hydrogen and Nitrogen atmosphere for CMOS silicon wafers
Specification
Samples must be CMOS compatible Silicon wafers, up to 25 wafers per load, up to 150mm diameter,
Item ID #.
Last Updated: 29th November, 2018
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