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Deep Reactive Ion Etcher
| MANUFACTURER | SPTS Ltd |
|---|---|
| MODEL | MP0531 |
| ACRONYM | DRIE |
London Centre for Nanotechnology
| TRAINING | Training is required to use this item and we can arrange this if needed. |
|---|
| CONTACT 1 | Steve Etienne |
|---|---|
| Enquire about this item | |
| SITE | Bloomsbury Campus |
Description
Surface Technology Systems ICP DRIE, + loadlock, samples up to 6 diameter
Gases: O2, Ar, SF6, CF4, C4F8 Processes: Deep Silicon Etch (Bosch process) to 500+ µm Shallow Si Etch
Specification
Surface Technology Systems ICP DRIE, + loadlock, samples up to 6 diameter
Gases: O2, Ar, SF6, CF4, C4F8 Processes: Deep Silicon Etch (Bosch process) to 500+ µm Shallow Si Etch
Item ID #.
Last Updated: 17th January, 2014
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